Research Grade Polarizing Microscope NP900
S NEOX
Spectrophotometer PEAK C-7200s
Spectrophotometer PEAK C-7200s
Spectrophotometer PEAK T-9200
TrueChrome 4K Pro
UV Maskless Lithography UV Litho-ACA
UV Maskless Lithography UV Litho-S+
Laser direct writing lithography technology and DMD maskless lithography technology. Laser direct write technology performs high-precision processing directly on the material surface using a laser beam , while DMD maskless technology uses a digital micromirror ray to project light beams for patterning, making its suitable for large- area lithography.
Faster processing speed, stronger equipment performance, suitable for small batch production and manufacturing.
*8-inch exposure area
*0.5 μm minimum critical dimension
*Scanner lithography
